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- W2000537573 abstract "Residual casting solvent present in resist films can have a profound effect on their dissolution behavior. We have used a radiolabeling technique to make quantitative measurements of solvent remaining in spin cast films after they have undergone different baking protocols. Films of poly (3-methyl-4-hydroxystyrene) were found to contain a significant fraction of propylene glycol methyl ether acetate (as much as 50% by weight) depending on the baking conditions. Films that were 1000 angstroms thick contained a higher percentage of residual solvent than films that were 1 micrometers . The solvent concentration in films containing a mixture of polymer and photoactive compound was a maximum for films containing 5 wt% PAC." @default.
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- W2000537573 date "1993-09-15" @default.
- W2000537573 modified "2023-09-26" @default.
- W2000537573 title "<title>Influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists</title>" @default.
- W2000537573 doi "https://doi.org/10.1117/12.154789" @default.
- W2000537573 hasPublicationYear "1993" @default.
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