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- W2000555712 abstract "Diamond-like carbon films (DLC) were prepared by radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) at a frequency of 13.56 MHz using methane (CH 4 ) and acetylene (C 2 H 2 ) at different RF powers. Optical emission spectroscopy (OES) was carried out to investigate plasma chemistry. The intensity of H α in the C 2 H 2 plasma was about one-half that in the CH 4 plasma, whereas in both cases, the intensities of CH radicals were similar. The resistivity of the deposited films decreased with an increase in RF power, whereas growth rate increased with RF power. CH 4 -based films were found to be more insulating than C 2 H 2 -based films at high RF powers. The high resistivity of the films was obtained from both CH 4 and C 2 H 2 at low RF powers. The insulating property was due to the hydrogenation of sp 2 bonds in the films." @default.
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- W2000555712 date "2006-10-01" @default.
- W2000555712 modified "2023-09-25" @default.
- W2000555712 title "Comparative Study on Chemical Vapor Deposition of Diamond-Like Carbon Films from Methane and Acetylene Using RF Plasma" @default.
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- W2000555712 doi "https://doi.org/10.1143/jjap.45.8398" @default.
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