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- W2000558581 abstract "The authors investigate selective epitaxy through SiO/sub 2/ masks of varied geometry with the goal of making planar photonic integrated circuits. The InGaAs/InP, InGaAsP/InP, and InGaAs/InGaAsP MQW material systems are studied with atmospheric and 100-torr MOVPE. Extremely large bandgap shifts (136 meV) can be achieved, more than enough to allow construction of lasers, modulators, and low-loss waveguides in a single plane.< <ETX xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>></ETX>" @default.
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- W2000558581 date "1992-09-01" @default.
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- W2000558581 title "Extremely large band gap shifts for MQW structures by selective epitaxy on SiO/sub 2/ masked substrates" @default.
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- W2000558581 doi "https://doi.org/10.1109/68.157130" @default.
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