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- W2000566893 abstract "The mechanism of SiH 4 adsorption to the bare Si defects in a hydrogen-terminated Si(001) surface is analyzed using ab initio molecular orbital calculations based on a cluster model. The energy barriers for the dissociative adsorption of SiH 4 are estimated to be 0.24 and 0 eV, depending on the environment around the bare Si defects. This result shows that the bare Si defects become the chemisorption sites of SiH 4 in chemical vapor deposition." @default.
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- W2000566893 date "1999-05-01" @default.
- W2000566893 modified "2023-09-27" @default.
- W2000566893 title "Quantum Chemical Study of Silane Decomposition on Hydrogen-Terminated Si(001) Surfaces" @default.
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- W2000566893 doi "https://doi.org/10.1143/jjap.38.2745" @default.
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