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- W2000575436 abstract "An ultrahigh vacuum deposition–reflectometer system was constructed to allow the deposition and subsequent in situ reflectance measurement of extreme-ultraviolet multilayer mirrors. In this article various aspects of the deposition chamber and the reflectance measurement setup are discussed. To demonstrate the capabilities of this system, Y/Mo multilayer mirrors were studied in detail by varying deposition conditions and measuring their subsequent in situ reflectance. By optimizing the deposition conditions, reflectances of 21.3%, 34.7%, and 46.1% were obtained for the Y/Mo mirrors at wavelengths of 7.9, 9.7, and 11.4 nm, respectively." @default.
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- W2000575436 date "1997-11-01" @default.
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- W2000575436 title "Ultrahigh vacuum deposition–reflectometer system for the <i>in situ</i> investigation of Y/Mo extreme-ultraviolet multilayer mirrors" @default.
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- W2000575436 doi "https://doi.org/10.1116/1.580849" @default.
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