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- W2000594874 abstract "Porous layers have been formed in Pyrex glass by reactive ion etching (RIE). Chromium is used as an etch mask. Different etch gases (SF6, CF4/Ar) have been used, and depending on flow ratio, etch time and applied power, a dense array of high aspect ratio glass pillars with submicrometer dimensions was obtained instead of a smooth channel bottom. The pillars were about 500nm tall and 50–100nm in cross-section. The formation of porous layers is explained by the effect of mask material re-deposition during the plasma etching. Porous glass layers could have applications in chromatographic separations or microchemicalsample concentrators." @default.
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- W2000594874 date "2004-01-01" @default.
- W2000594874 modified "2023-09-30" @default.
- W2000594874 title "Formation of Nanoporous Glass Layer" @default.
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- W2000594874 doi "https://doi.org/10.1088/0031-8949/2004/t114/015" @default.
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