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- W2000615063 abstract "As advanced photolithography extends the ability to print feature sizes below the 100 nm technology node, various reticle enhancement techniques (RET) are being employed to improve resolution. An example of RET is the alternating phase shift mask (APSM), which currently challenges the ability of conventional repair techniques to repair even the most basic reticle defect. The phase shifting quartz bump is one defect type critical to the performance of APSM technology masks. These defects on the APSM reticle are caused by imperfections in the resist image during processing, resulting in a localized under or over etch of the quartz substrate. The integrated application of gas assisted etch (GAE), focused ion beam (FIB) reticle repair, and atomic force microscopy (AFM), provide a comprehensive solution for advanced reticle defect repair and characterization. Ion beam repair offers superior accuracy and precision for removal without significant damage to the underlying or adjacent quartz. The AFM technique provides quantitative measurement of 3D structures, including those associated with alternating phase shifters etched into quartz as well as embedded shifters. In the work presented in this paper, quartz bum defects were pre-scanned on an AFM tool and proprietary software algorithms were used to generate defect image and height map files for transfer to the FIB reticle repair tool via a network connection. The FIB tool then used these files to control selectively the ion dose during the corresponding quartz defect repair. A 193 nm APSM phase shift photomask with programmed defects in 400 nm line and space pattern was repaired using an FEI Stylus NanoProfilometer (SNP) and a FEI Accura 850 focus ion beam (FIB) tool. Using the APSM FIB repair method, the transmittance evaluated from 193 nm AIMS at the repair area was more than 90% without post-processing." @default.
- W2000615063 created "2016-06-24" @default.
- W2000615063 creator A5005344721 @default.
- W2000615063 creator A5012302153 @default.
- W2000615063 creator A5057061954 @default.
- W2000615063 creator A5066394564 @default.
- W2000615063 creator A5076212740 @default.
- W2000615063 date "2003-08-26" @default.
- W2000615063 modified "2023-09-23" @default.
- W2000615063 title "New advancements in focused ion beam repair of alternating phase-shift masks" @default.
- W2000615063 cites W1964738582 @default.
- W2000615063 cites W1997961440 @default.
- W2000615063 cites W2513119904 @default.
- W2000615063 doi "https://doi.org/10.1117/12.504211" @default.
- W2000615063 hasPublicationYear "2003" @default.
- W2000615063 type Work @default.
- W2000615063 sameAs 2000615063 @default.
- W2000615063 citedByCount "0" @default.
- W2000615063 crossrefType "proceedings-article" @default.
- W2000615063 hasAuthorship W2000615063A5005344721 @default.
- W2000615063 hasAuthorship W2000615063A5012302153 @default.
- W2000615063 hasAuthorship W2000615063A5057061954 @default.
- W2000615063 hasAuthorship W2000615063A5066394564 @default.
- W2000615063 hasAuthorship W2000615063A5076212740 @default.
- W2000615063 hasConcept C105487726 @default.
- W2000615063 hasConcept C120665830 @default.
- W2000615063 hasConcept C121332964 @default.
- W2000615063 hasConcept C145148216 @default.
- W2000615063 hasConcept C146617872 @default.
- W2000615063 hasConcept C14737013 @default.
- W2000615063 hasConcept C160671074 @default.
- W2000615063 hasConcept C161866238 @default.
- W2000615063 hasConcept C168834538 @default.
- W2000615063 hasConcept C171250308 @default.
- W2000615063 hasConcept C178790620 @default.
- W2000615063 hasConcept C185592680 @default.
- W2000615063 hasConcept C192562407 @default.
- W2000615063 hasConcept C207789793 @default.
- W2000615063 hasConcept C2779227376 @default.
- W2000615063 hasConcept C49040817 @default.
- W2000615063 hasConcept C50774322 @default.
- W2000615063 hasConcept C53524968 @default.
- W2000615063 hasConceptScore W2000615063C105487726 @default.
- W2000615063 hasConceptScore W2000615063C120665830 @default.
- W2000615063 hasConceptScore W2000615063C121332964 @default.
- W2000615063 hasConceptScore W2000615063C145148216 @default.
- W2000615063 hasConceptScore W2000615063C146617872 @default.
- W2000615063 hasConceptScore W2000615063C14737013 @default.
- W2000615063 hasConceptScore W2000615063C160671074 @default.
- W2000615063 hasConceptScore W2000615063C161866238 @default.
- W2000615063 hasConceptScore W2000615063C168834538 @default.
- W2000615063 hasConceptScore W2000615063C171250308 @default.
- W2000615063 hasConceptScore W2000615063C178790620 @default.
- W2000615063 hasConceptScore W2000615063C185592680 @default.
- W2000615063 hasConceptScore W2000615063C192562407 @default.
- W2000615063 hasConceptScore W2000615063C207789793 @default.
- W2000615063 hasConceptScore W2000615063C2779227376 @default.
- W2000615063 hasConceptScore W2000615063C49040817 @default.
- W2000615063 hasConceptScore W2000615063C50774322 @default.
- W2000615063 hasConceptScore W2000615063C53524968 @default.
- W2000615063 hasLocation W20006150631 @default.
- W2000615063 hasOpenAccess W2000615063 @default.
- W2000615063 hasPrimaryLocation W20006150631 @default.
- W2000615063 hasRelatedWork W1986705012 @default.
- W2000615063 hasRelatedWork W2030106306 @default.
- W2000615063 hasRelatedWork W2038186665 @default.
- W2000615063 hasRelatedWork W2041799840 @default.
- W2000615063 hasRelatedWork W2061217763 @default.
- W2000615063 hasRelatedWork W2073728321 @default.
- W2000615063 hasRelatedWork W2079977581 @default.
- W2000615063 hasRelatedWork W2574075063 @default.
- W2000615063 hasRelatedWork W4245579348 @default.
- W2000615063 hasRelatedWork W4250309625 @default.
- W2000615063 isParatext "false" @default.
- W2000615063 isRetracted "false" @default.
- W2000615063 magId "2000615063" @default.
- W2000615063 workType "article" @default.