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• W2000644808 abstract "The development of high power lasers requires highly damage- resistant optical coatings. Present multilayer dielectric coatings do not have sufficient laser-induced damage thresholds (LIDTs) to pulsed lasers, particularly in the short wavelength region. The LIDT strongly depends on the absorption coefficient of optical coatings and the absorbing contaminants on the optical substrate. The absorption of optical coatings can be minimized by optimizing the deposition condition. However, polishing compound embedded inside subsurface among the absorbing contaminants cannot be completely removed by standard optical cleaning techniques. In this paper, the significant improvement of LIDT of optical coatings on subsurface-damage removed fused silica glass due to ion etching is presented." @default.
• W2000644808 created "2016-06-24" @default.
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• W2000644808 date "2000-04-03" @default.
• W2000644808 modified "2023-09-23" @default.
• W2000644808 title "Optical properties and laser damage of thin films deposited by reactive rf-magnetron sputtering" @default.
• W2000644808 doi "https://doi.org/10.1117/12.380866" @default.
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