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• W2000647832 abstract "Herein, we will propose a new application possibility of epsilon-near-zero (ENZ) materials: high resolution wide-field imaging. We show that the resolution can be dramatically enhanced by simply inserting a thin epsilon-near-zero (ENZ) material between the sample and substrate. By performing metal half-plane imaging, we experimentally demonstrate that the resolution could be enhanced by about 47% with a 300-nm-thick SiO2 interlayer, an ENZ material at 8-μm-wavelength (1250 cm-1). The physical origin of the resolution enhancement is the strong conversion of diffracted near fields to quasi-zeroth order far fields enabled by the directive emission of ENZ materials." @default.
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• W2000647832 date "2014-12-17" @default.
• W2000647832 modified "2023-09-25" @default.
• W2000647832 title "Epsilon-Near-Zero meta-lens for high resolution wide-field imaging" @default.
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• W2000647832 doi "https://doi.org/10.1364/oe.22.031875" @default.
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