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- W2000660434 abstract "With the ever-increasing demands upon processes used in VLSI technology and trends toward increased wafer size, proportionate demands are being placed on ion implanter manufacturers for improvement in areas such as machine automation, dosimetry, wafer cooling, particle reduction, beam purity, channeling control and wafer charging effects, to name a few. This paper will discuss an experimental evaluation of a scan compensator module developed by Varian/Extrion for the purpose of improving implant uniformity. This module is utilized on their medium current, electrostatic scanning, serial ion implanters and is offered as a retrofit. Gains in uniformity are evident for an earlier machine; however, optimum performance may vary from one situation to another." @default.
- W2000660434 created "2016-06-24" @default.
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- W2000660434 date "1991-04-01" @default.
- W2000660434 modified "2023-09-27" @default.
- W2000660434 title "Implant uniformity evaluation using a Varian/Extrion scan compensator module on an electrostatic scanning ion implanter" @default.
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- W2000660434 doi "https://doi.org/10.1016/0168-583x(91)96162-e" @default.
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