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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2000663607> ?p ?o ?g. }

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• W2000663607 abstract "Polycrystalline silicon was deposited on Corning 7059 glass by remote plasma chemical vapor deposition using SiF2/H2. Raman spectroscopy indicated a crystalline fraction of 85% in films deposited at a substrate temperature of 350 °C. Thin film transistors made of this material exhibited a field effect mobility of 7.5 cm2/V s and a threshold voltage of 6.1 V." @default.
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• W2000663607 date "1994-09-26" @default.
• W2000663607 modified "2023-10-16" @default.
• W2000663607 title "Polycrystalline silicon thin film transistors deposited at low substrate temperature by remote plasma chemical vapor deposition using SiF₄/H₂" @default.
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• W2000663607 doi "https://doi.org/10.1063/1.112937" @default.
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