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- W2000688085 abstract "This paper describes the thermal desorption of Cs from oxidized Si(100), measured as a function of sample temperature and oxygen coverage. The desorption process is found to be governed by a broad distribution of the activation energy for thermal desorption of the Cs atoms, which reflects the considerable inhomogeneity of the Si surfaces. The weight of the distribution is found to shift to higher activation energy with increasing oxygen coverage of the Si substrates." @default.
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- W2000688085 title "Influence of oxygen on the thermal desorption of Cs from Si(100)" @default.
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- W2000688085 doi "https://doi.org/10.1016/s0039-6028(97)00828-5" @default.
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