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- W2000694414 abstract "Using Langmuir probe-assisted laser photodetachment, the temporal evolution of the O − density was determined in the bulk plasma of a unipolar pulsed-dc magnetron. The source was operated in reactive mode, at a fixed nominal on-time power of 100 W, sputtering Ti in argon–oxygen atmospheres at 1.3 Pa pressure, but over a variation of duty cycles from 5% to 50% and oxygen partial pressures of 10% and 50% of the total pressure. In the plasma on-time, for all duty cycles the negative ion density ( n − ) rises marginally reaching values typically less than 2 × 10 15 m −3 with negative ion-to-electron density ratios, α < 1. However, immediately after the transition from pulse on-to-off, n − falls by about 20–30% as fast O − species created at the cathode exit the system. This is followed by a rapid rise in n − to values at least 2 or 3 times that in the on-time. The rate of rise of n − and its maximum value both increase with decreasing duty cycle. In the off-time, the electron density falls rapidly (initial decay rates of several tens of μs), and therefore the afterglow plasma becomes highly electronegative, with α reaching 4.6 and 14.4 for 10% and 50% oxygen partial pressure, respectively. The rapid rise in n − in the afterglow (in which the electron temperature falls from about 5 to 0.5 eV) is attributed to the dissociative attachment of highly excited oxygen metastables, which themselves are created in the pulse on-time. At the lowest duty of 5%, the long-term O − decay times are several hundred μs. Langmuir probe characteristics show the clear signature that negative ions dominate over the electrons in the off-time. From the ion and electron saturation current ratios, α has been estimated in some chosen cases and found to agree within a factor between 2 and 10 with those obtained more directly from the photodetachment method." @default.
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- W2000694414 date "2010-12-02" @default.
- W2000694414 modified "2023-10-03" @default.
- W2000694414 title "A study of the plasma electronegativity in an argon–oxygen pulsed-dc sputter magnetron" @default.
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- W2000694414 doi "https://doi.org/10.1088/0022-3727/43/50/505205" @default.
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