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- W2000705390 abstract "We performed micromachining of relatively thick siloxane films by proton beam writing (PBW) with beam energy of 1 MeV. The polydimethylsiloxane (PDMS) prepolymer films with a thickness of about 13 μm were spin-coated onto silicon substrates. After exposure to the 1-MeV proton beam (~1 μm in diameter), the samples were developed. The PDMS shows the behavior of negative resist and can be regarded as analog resist where the thickness of the structure gradually increases as a function of the proton beam (PB) fluence. Using this feature of the PDMS, we manufactured micro lenses with diameter of 40 μm by changing PB fluence. Micro-patterning of the PDMS films using scanning proton beam can offer a possibility of making three-dimensional structures for silica-based devices without baking and mask process." @default.
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- W2000705390 date "2011-01-01" @default.
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- W2000705390 title "Fabrication of silica-based three-dimensional structures by changing fluence using proton beam writing" @default.
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- W2000705390 doi "https://doi.org/10.14723/tmrsj.36.325" @default.
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