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- W2000712974 abstract "The device structure and experimental operation of an integrated optical waveguide and charge-coupled device (CCD) detector array are considered. The use of silicon as a substrate allows direct fabrication of the CCD detector array and a thermally oxidized layer of SiO <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</inf> forms an effective substrate for waveguide deposition. The detector array is composed of a two-phase overlapping-gate CCD with first-level polycrystalline silicon electrodes and second-level aluminum electrodes connected in parallel by means of a series of gates to an array of pbotodiodes. In the photodiode region the SiO <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</inf> layer is tapered to a termination so that with minimal scatter, light is multiply refracted into the detector region. The center-to-center detector element spacing of the device fabricated and successfully operated is 32 μm. Optimum detector length is considered as a function of waveguide thickness. The integrated waveguide-CCD array is expected to become an integral part of various signal-processing devices." @default.
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- W2000712974 title "An integrated optical waveguide and charge-coupled-device image array" @default.
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- W2000712974 doi "https://doi.org/10.1109/jqe.1977.1069311" @default.
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