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- W2000718304 abstract "Crystalline TaB2 was deposited using the chemical vapor deposition reaction of TaCl5 and B2H6 in the temperature range 773–1200 K. Thermodynamic calculations were made which compared the use of both B2H6 and BCl3 as boron source gases. The deposits obtained with B2H6 had an extremely small crystal size and contained amorphous boron when the deposition temperature was below approximately 873 K but were substoichiometric in boron above this temperature. Carbon analysis indicated that carbon may be substituting for boron and thereby stabilizing the diboride structure at high deposition temperatures. The microhardness of the coatings decreased with increasing atomic ratio of boron to tantalum and decreasing crystal size." @default.
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- W2000718304 date "1980-10-01" @default.
- W2000718304 modified "2023-09-24" @default.
- W2000718304 title "Low temperature chemical vapor deposition of TaB2" @default.
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- W2000718304 doi "https://doi.org/10.1016/0040-6090(80)90541-6" @default.
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