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- W2000720257 abstract "Experimental results are presented on the electrical properties of diffusion-barrier-containing ohmic multilayer systems of the type Au/WSiN/(Au,Ge,Ni) on GaAs (n ≈ 2 × 1017cm−3) prepared by vapour phase epitaxy. The transmission line method contact resistance Rc is measured as a function of the layer sequence, composition and reduced total thickness of the internal ohmic (Au,Ge,Ni) system. As for ohmic contacts without diffusion barrier layers, minimum Rc values in the 0.1 Ω mm range are obtained if the gold and germanium layer thicknesses are above about 20 nm. The results are discussed in a secondary phase model and with respect to the low alloying depth being relevant for the contact design of special GaAs devices." @default.
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- W2000720257 date "1992-09-01" @default.
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- W2000720257 title "Ohmic behaviour of Au/WSiN/(Au,Ge,Ni)-n-GaAs systems" @default.
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- W2000720257 doi "https://doi.org/10.1016/0040-6090(92)90614-h" @default.
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