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- W2000737411 abstract "A1N films were deposited onto silicon substrates in d.c. planar magnetron system by means of reactive sputtering of aluminium in an atmosphere of nitrogen. The influence of the deposition conditions and of post-deposition annealing on the properties of the insulator and the A1NSi interface were investigated." @default.
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- W2000737411 date "1981-07-01" @default.
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- W2000737411 title "Deposition of A1N thin films by magnetron reactive sputtering" @default.
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