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- W2000739837 abstract "We prepared phosphorous-doped n-type beta-irondisilicide (β-FeSi2) thin films by co-sputtering followed by thermal annealing method using Si, Fe and Fe3P as sputtering source. Phosphorous doping changed the conductivity of beta-irondisilicide films from p-type to n-type. In addition, the resistivity decreased with phosphorous doping by more than one order. However, the structure of the films changed to FeSi at the higher doping levels." @default.
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- W2000739837 date "2002-10-01" @default.
- W2000739837 modified "2023-10-11" @default.
- W2000739837 title "Phosphorous doping in beta-irondisilicide by co-sputtering method" @default.
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- W2000739837 doi "https://doi.org/10.1016/s0167-577x(02)00531-1" @default.
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