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- W2000741559 abstract "The polarization dependence of the electric field intensity distributions in photoresist films has been studied by simulation. S-polarized illumination produces higher image contrast than P-polarized illumination in air. However, due to the high refractive indices of photoresist films, the difference of the image contrasts formed by S- and P-polarized illuminations almost disappears in the photoresist films. The reflectivities from nonplanar substrates strongly depend on the polarization of illumination. The reflection from nonplanar substrates can be strongly suppressed by using P-polarized illumination." @default.
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- W2000741559 date "1994-12-01" @default.
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- W2000741559 title "Polarization Dependence of Electric Field Intensity Distributions in Photoresist Films" @default.
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- W2000741559 doi "https://doi.org/10.1143/jjap.33.6998" @default.
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