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- W2000753709 abstract "The effect of introducing a polysilicate or polysiloxane spin-on glass (SOG) as a component of the interlevel dielectric in a multilevel integrated circuit on the hot-carrier aging of the MOS transistor is discussed. It was found that the presence of SOG led to accelerated aging of the MOS transistor: factors of 20 and 5 for silicate and siloxane, respectively. This effect is attributed to water absorbed in the SOG films. a correlation was found for the hot-carrier aging rate and the amount of absorbed water.< <ETX xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>></ETX>" @default.
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- W2000753709 date "1991-03-01" @default.
- W2000753709 modified "2023-09-27" @default.
- W2000753709 title "Hot-carrier aging of the MOS transistor in the presence of spin-on glass as the interlevel dielectric" @default.
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- W2000753709 doi "https://doi.org/10.1109/55.75737" @default.
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