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- W2000757598 abstract "Abstract Polymers obtained via ring-opening metathesis polymerization (ROMP) were investigated as positive resist materials under 254 nm irradiation. The principle of chemical amplification was applied to polymers of exo,endo-di(tetrahydropyranyl)bicyclo[2-2-1]hept-5-ene-2,3-dicarboxylate (monomer 1) and exo,exo-di(tetrahydropyranyl)-7-oxa-bicyclo[2-2-1]hept-5-ene-2,3-dicarboxylate (monomer 2) using 2,6-dinitrobenzyl tosylate as a photoacid generator. Positive images were obtained upon development of post-exposure baked films in aqueous solutions of tetramethylammonium hydroxide (TMAH). Depending on the composition of the polymers, sensitivities in the range 20–450 mJ·cm −1 were obtained." @default.
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- W2000757598 date "1999-01-01" @default.
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- W2000757598 title "New positive resists with cycloaliphatic structures in the main chain" @default.
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- W2000757598 doi "https://doi.org/10.1016/s0014-3057(98)00094-9" @default.
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