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- W2000762079 abstract "With a goal of preparing silicon-based interactive filters in the micropore range, we have developed the first single-step etch-liftoff procedure (one-step separation) based on the formation and removal of macroporous silicon layers. With silicon wafers whose resistivities are in the range from , we are able to create, in a surprisingly controlled manner, films whose pore diameters range from and whose thickness ranges from . These silicon-based films (filters), which carry a polarizing negative charge, represent an alternative to porous alumina (films) filters (pore diameter not yet in the range) both in terms of their size range and potential interaction-reaction at elevated temperature. Preliminary experiments demonstrate that platinum and copper can be introduced to these filters using electroless solutions with a goal to creating an effective reductive surface. Using these and alternate material combinations, interactive-reactive filters in the size range that operate at temperatures well in excess of porous polymer films can be realized." @default.
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- W2000762079 date "2008-01-01" @default.
- W2000762079 modified "2023-10-11" @default.
- W2000762079 title "Development of Porous-Silicon-Based Active Microfilters" @default.
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- W2000762079 doi "https://doi.org/10.1149/1.2811868" @default.
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