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- W2000765334 abstract "In this letter, a strategy to minimize the error in lifetime projections using a positive bias temperature instability (PBTI) test has been proposed. Two distinctly different projection slopes were observed in a plot of time to failure versus oxide electric field. A small slope in the high-field region, which means weaker electric field dependence, led to an underestimation of lifetime. This result was attributed to a filled trap cluster at a specific trap energy level, locally reducing the oxide electric field. Thus, different lifetimes can be projected depending on stress bias. Maintaining a PBTI stress bias range below this trap energy level is recommended for accurate projections." @default.
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- W2000765334 date "2012-11-01" @default.
- W2000765334 modified "2023-10-18" @default.
- W2000765334 title "New Insight Into PBTI Evaluation Method for nMOSFETs With Stacked High- $k$/IL Gate Dielectric" @default.
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- W2000765334 doi "https://doi.org/10.1109/led.2012.2211072" @default.
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