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- W2000774915 abstract "Electrons in the electron/hole creation event are shown to be the prime catalytic agent in photon-stimulated oxidation enhancement of silicon. Oxidation enhancement in the 10–50% range occurs at only moderate power density levels of visible wavelength light and increases greatly for photon energies just exceeding the conduction-band edge between SiO2 and Si. ‘‘Hot’’-electron injection into the SiO2 is thought to enhance the oxidation via a process of electron attachment to some of the in-diffusing O2 species, with subsequent dissociation into O and O− species. This injected hot-electron flux reaction with O2 is thought to also occur at a reduced level during standard thermal oxidation." @default.
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- W2000774915 date "1987-01-05" @default.
- W2000774915 modified "2023-09-26" @default.
- W2000774915 title "Electron population factor in light enhanced oxidation of silicon" @default.
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- W2000774915 doi "https://doi.org/10.1063/1.98126" @default.
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