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- W2000787170 abstract "Single-crystalline ferrite was masklessly etched by focused Ar + laser irradiation in CCl 4 gas and in H 3 PO 4 solution. Etching rates up to 68 µm/s in CCl 4 and 340 µm/s in H 3 PO 4 have been achieved by laser processes. Bending of the etched narrow groove was observed in CCl 4 gas due to the enhanced reflection caused by the polarization of the laser beam when focused by a microscope objective lens. A vertical slab structure with a high aspect ratio of up to 40 has been obtained by the light-guiding effect of the laser beam in wet-chemical etching. RBS analysis of the processed surface revealed that laser-induced damage was much lower than that induced by mechanical polishing." @default.
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- W2000787170 date "1989-10-01" @default.
- W2000787170 modified "2023-09-23" @default.
- W2000787170 title "Laser-Induced Etching of Mn-Zn Ferrite an Its Application" @default.
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- W2000787170 doi "https://doi.org/10.1143/jjap.28.2151" @default.
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