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- W2000804491 abstract "In order to obtain ZnSe substrates, very thick single-crystalline ZnSe layers have been grown. Polycrystalline ZnSe was evaporated at 885°C and recrystallized epitaxially on a GaAs(100) substrate maintained at 350°C in an evacuated quartz tube. A layer with thickness of about 100 μm was obtained after the growth period of 50 h. The etch-pit density on the cleaved surface was about 107 cm−2." @default.
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- W2000804491 date "1995-10-01" @default.
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- W2000804491 title "ZnSe thick layers grown on GaAs by physical vapor deposition" @default.
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- W2000804491 doi "https://doi.org/10.1016/0022-0248(95)00238-3" @default.
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