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- W2000841289 abstract "The effect of phosphorous incorporation on the deposition rate of phosphosilicate glass from the reaction of PH3, O2, and tetraethoxysilane (TEOS) has been studied. The previously reported apparent catalytic effect of PH3 on the deposition rate of SiO2 has been reproduced in this study, but by utilizing a newly designed hot-walled low-pressure chemical vapor deposition (LPCVD) reactor, homo- and heterogeneous catalytic effects were separated. These results indicate that the source of the catalytic effect is purely homogeneous, possibly involving an oxidation product of PH3 reacting with TEOS. Results obtained in a cold-wall reactor suggest that PH3 and O2 serve to poison the surface decomposition reaction of TEOS to produce SiO2." @default.
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- W2000841289 date "1993-02-15" @default.
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- W2000841289 title "Catalytic effect of phosphine on the deposition of phosphosilicate glass from tetraethoxysilane" @default.
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- W2000841289 doi "https://doi.org/10.1063/1.108844" @default.
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