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- W2000850550 abstract "FeSi films have been rf sputtered on glass, fused silica, and Si substrates. Sputter targets of 2 and 7 wt% Si were used, and the film thickness was varied between 0.1 and 4 μm. Several films, especially those on glass in the 0.5-μm-thickness range, showed a characteristic roughly rectangular domain structure. The films were isotropic. The structure has been analyzed with the longitudinal magneto-optic Kerr effect by rotating either the film or the demagnetizing field in the film plane. The magnetization made an angle of about 18° with the longer walls. A new magnetization process, ``wall rotation'', could be observed." @default.
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- W2000850550 date "1973-09-01" @default.
- W2000850550 modified "2023-09-26" @default.
- W2000850550 title "Observation of a new domain configuration in polycrystalline FeSi films" @default.
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- W2000850550 doi "https://doi.org/10.1063/1.1654887" @default.
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