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- W2000863527 abstract "Photoelectric properties of polycrystalline silicon films under influence of illumination were investigated. The possibility of forming polysilicon films by pulse thermal annealing has been shown. Obtained results of measurements have been analyzed from the viewpoint of the model of polycrystalline film conductance taking intergrain barriers of the Shottky type. It was shown that polysilicon film with fine grain size may be use as short wave photodetectors due to the presence of shallow p-n junctions at their grain boundary." @default.
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- W2000863527 date "2001-06-12" @default.
- W2000863527 modified "2023-09-26" @default.
- W2000863527 title "Photodetectors on the base of local polysilicon films" @default.
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- W2000863527 doi "https://doi.org/10.1117/12.429741" @default.
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