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- W2000905170 abstract "Femtosecond laser ablation using the combination of 260 nm pulses and 780 nm pulses is explored for the high speed and high quality selected removal of insulating layers." @default.
- W2000905170 created "2016-06-24" @default.
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- W2000905170 date "2007-05-01" @default.
- W2000905170 modified "2023-09-24" @default.
- W2000905170 title "Dual Wavelength Femtosecond Laser Materials Processing" @default.
- W2000905170 cites W2061846298 @default.
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- W2000905170 doi "https://doi.org/10.1109/cleo.2007.4452824" @default.
- W2000905170 hasPublicationYear "2007" @default.
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