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- W2000974852 abstract "We have studied the effect of Ga ion irradiation on the controllable hysteretic behavior of graphene field effect transistors fabricated on Si/SO2 substrates. The various densities of defects in graphene were monitored by Raman spectrum. It was found that the Dirac point shifted to the positive gate voltage constantly, while the hysteretic behavior was enhanced first and then weakened, with the dose of ion irradiation increasing. By contrasting the trap charges density induced by dopant and the total density of effective trap charges, it demonstrated that adsorbate doping was not the decisive factor that induced the hysteretic behavior. The tunneling between the defect sites induced by ion irradiation was also an important cause for the hysteresis." @default.
- W2000974852 created "2016-06-24" @default.
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- W2000974852 date "2014-09-29" @default.
- W2000974852 modified "2023-09-27" @default.
- W2000974852 title "Manipulation of transport hysteresis on graphene field effect transistors with Ga ion irradiation" @default.
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- W2000974852 doi "https://doi.org/10.1063/1.4897005" @default.
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