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- W2000991969 abstract "Rutherford backscattering spectrometry (RBS) has been used to characterize multilayered Cr/Ni structures which are being prepared for future distribution as sputter profiling standards. The multilayered structures were prepared by alternately sputter depositing layers of approximately 60 nm each of Ni and Cr for a total of nine layers; these fine structured films were prepared under high vacuum conditions. Samples from three batches of 100 specimens each were analyzed using RBS from 2 MeV 4He projectiles scattered at 165°. Although the kinematic factors for these scattering parameters would indicate that individual Ni and Cr layers should not be resolved, bilayers of Ni and Cr were clearly resolved in the RBS spectra. That is, the unresolved energy group formed from 4He scattered from the 1st layer of Cr and 1st layer of Ni is completely resolved from the energy group formed from scattering from the 2nd layer of Cr and the 2nd layer of Ni and so forth for all deeper layers. The ability to resolve the periodic bilayered structure provides a sensitive determination of the component film thickness by direct comparison with computer simulated spectra. The RBS analyses show that the sample preparation was well controlled and that film thicknesses of like layers of any one as well as between any two samples were uniform to better than 3%. This latter accuracy holds for any two samples within one batch or from batch to batch. Results from Auger sputter-depth ptofile measurements of the uniformity of individual layer thickness and periodicity support these conclusions." @default.
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- W2000991969 date "1983-12-01" @default.
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- W2000991969 title "Rutherford backscattering analysis of multilayered CrNi structures to be used for sputtering standards" @default.
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- W2000991969 doi "https://doi.org/10.1016/0167-5087(83)91047-5" @default.
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