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- W2001032922 abstract "In situ monitoring parameters are indispensable for thin film fabrication. Among them, thickness and deposition rate control are often the most important in achieving the reproducibility necessary for technological exploitation of physical phenomena dependent on film microstructure. This review describes the types of thickness and deposition rate sensors and their theoretical and phenomenological background, underlining their performances, as well as advantages and disadvantages." @default.
- W2001032922 created "2016-06-24" @default.
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- W2001032922 date "2005-01-07" @default.
- W2001032922 modified "2023-10-16" @default.
- W2001032922 title "State of the art in thin film thickness and deposition rate monitoring sensors" @default.
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- W2001032922 doi "https://doi.org/10.1088/0034-4885/68/2/r04" @default.
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