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• W2001333457 abstract "The use of organometallic compounds in plasma-enhanced chemical vapour deposition is presented by a number of examples. The deposition technique, the choice of precursor and the nature of the resulting films are discussed." @default.
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• W2001333457 date "1991-12-01" @default.
• W2001333457 modified "2023-10-09" @default.
• W2001333457 title "Applications and trends in plasma-enhanced organometallic chemical vapour deposition" @default.
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• W2001333457 doi "https://doi.org/10.1016/0257-8972(91)90061-z" @default.
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