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- W2001707036 abstract "In this paper, the progression of optical lithography from a spectral (or wavelength) perspective is presented. The interdependencies between materials, sources, design challenges, and scaling are described relative the needs of semiconductor device generations. Comparisons of materials and approaches for use in the blue-UV, the mid-UV, the deep-UV, and to EUV wavelengths are provided showing the spectral influences for choices made. Inorganic and organic lithography materials, sources of radiation, and incremental wavelength shrink are compared for lithography generations from g-line to EUV and beyond." @default.
- W2001707036 created "2016-06-24" @default.
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- W2001707036 date "2012-03-29" @default.
- W2001707036 modified "2023-09-23" @default.
- W2001707036 title "The saga of lambda: spectral influences throughout lithography generations" @default.
- W2001707036 doi "https://doi.org/10.1117/12.920025" @default.
- W2001707036 hasPublicationYear "2012" @default.
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