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• W2001917823 abstract "Thermo-mechanical reliability is an important issue for the development and deployment of the through-silicon-via (TSV) technology in three-dimensional (3D) microelectronic packaging. The mismatch in coefficient of thermal expansion (CTE) between the array of copper (Cu) lines and the surrounding silicon (Si), upon temperature variation, affects the overall thermal expansion behavior of the whole TSV structure itself and generates an internal stress state. In this work we use the finite element method to numerically study the effective in-plane CTE of the Si/Cu composite structure. A 3D unit-cell approach is undertaken, which takes into account uniformly distributed TSVs in the Si chip. Results of the temperature-dependent effective CTE can be used as model input for simulating larger-scale 3D packages where the Si/Cu TSV structure is treated as a homogeneous material. We also examine the evolution of stress and deformation fields, and identify potential reliability concerns associated with the thermal loading." @default.
• W2001917823 created "2016-06-24" @default.
• W2001917823 creator A5054124562 @default.
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• W2001917823 date "2012-03-01" @default.
• W2001917823 modified "2023-09-24" @default.
• W2001917823 title "Thermal expansion behavior of through-silicon-via structures in three-dimensional microelectronic packaging" @default.
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• W2001917823 doi "https://doi.org/10.1016/j.microrel.2011.11.001" @default.
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