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- W2002072277 abstract "Need for inorganic electron beam resist with higher sensitivity and resolution is indisputable. We have developed such a resist that also shows lower line edge roughness. It is pre-baked at 300^oC. By using 4kV EB we have delineated 40nm lines pattern and honeycomb structure Photonic crystal pattern." @default.
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- W2002072277 date "2007-05-01" @default.
- W2002072277 modified "2023-09-27" @default.
- W2002072277 title "Improving the sensitivity and line edge roughness in inorganic positive electron beam resist" @default.
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- W2002072277 doi "https://doi.org/10.1016/j.mee.2007.01.144" @default.
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