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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2002122025> ?p ?o ?g. }

• W2002122025 abstract "The ranges and the average quadratic deviation of some light ions (H ,H e ,B ,G a and Ar) in polymethyl methacrylate are calculated over a wide energy region using computer simulation of the accelerated ion penetration. The electronic and nuclear losses and other physical parameters concerning the irradiated polymer resist region in the case of He bombardment are also presented. Some peculiarities of the chemically amplied resists used in ion nanolithography are also discussed. 2001 Elsevier Science Ltd. All rights reserved." @default.
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• W2002122025 title "Why light ions in future ion lithography?" @default.
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• W2002122025 doi "https://doi.org/10.1016/s0042-207x(00)00449-8" @default.
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