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• W2002135458 abstract "This paper describes the microfabrication of transparent thermoplastic plates, polymethyl-methacrylate, polycarbonate, and cyclic olefin polymer by an electron cyclotron resonance-reactive ion etching (ECR-RIE) system. The system was adopted for the microstructure with smooth surface and high-aspect ratio. The etching was carried out using O2/CF4 plasma. The etching conditions are set at 13.56 MHz high-frequency output of 100 W (self-bias voltage: -430 V--310 V) and the stage temperature of -15°C. We have examined the surface roughness and the optical properties at the range of process pressure 0.05-0.5 Pa. The surface roughness of etched substrates is below 20 nm and the average transmittance is over 98% at the process pressure of 0.05 Pa." @default.
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• W2002135458 date "2009-01-01" @default.
• W2002135458 modified "2023-09-24" @default.
• W2002135458 title "Microfabrication of Transparent Thermoplastic Resin Plates by Dry Etching" @default.
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• W2002135458 doi "https://doi.org/10.3131/jvsj2.52.138" @default.
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