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• W2002591194 abstract "Hydrogenated amorphous carbon (a-C:H) films have been prepared in a r.f. deposition reactor on negatively self-biased substrates from pure CH4 gas at a relatively low pressure (2.5 Pa) and over a wide range of substrate bias voltages VSB (200–1200 V). Changes in film properties due to bias have been systematically investigated by scanning electron microscopy, transmission electron microscopy, Fourier transform IR spectroscopy ellipsometry and microhardness. The experimental results revealed that a-C:H properties are highly dependent on VSB." @default.
• W2002591194 created "2016-06-24" @default.
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• W2002591194 date "1991-08-01" @default.
• W2002591194 modified "2023-09-27" @default.
• W2002591194 title "Plasma deposition of hydrogenated amorphous carbon (a-C:H) under a wide bias potential range" @default.
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• W2002591194 doi "https://doi.org/10.1016/0257-8972(91)90271-w" @default.
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