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• W2002657710 abstract "Spectroscopic ellipsometry installed on a GEN-II plasma assisted molecular beam epitaxy machine has been shown to be an effective in situ real time tool for monitoring the kinetics of gallium adlayer adsorption/desorption on the GaN surface. In this work, the authors present data on the study of Ga adsorption/desorption on polar c-plane GaN (0001) and nonpolar m-plane GaN (1−100) surfaces for Ga beam equivalent pressures in the range of 8.96×10−8–1.86×10−7Torr, Ga pulses in the range of 5–360s, and for substrate temperatures between 650 and 750°C." @default.
• W2002657710 created "2016-06-24" @default.
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• W2002657710 date "2007-05-01" @default.
• W2002657710 modified "2023-09-24" @default.
• W2002657710 title "Kinetics of gallium adlayer adsorption/desorption on polar and nonpolar GaN surfaces" @default.
• W2002657710 cites W1608033936 @default.
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• W2002657710 doi "https://doi.org/10.1116/1.2720856" @default.
• W2002657710 hasPublicationYear "2007" @default.
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