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- W2002685102 abstract "A new fabrication technology is proposed in which thin-film wafer fusion is used to develop high-performance optoelectronic devices on a lattice-mismatched substrate. By using this technology, buried-heterostructure InP-based lasers on GaAs substrate have been realised for the first time. A continuous-wave threshold current of 10.6 mA has been realised with a stable fundamental transverse mode." @default.
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- W2002685102 date "1999-01-01" @default.
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- W2002685102 title "Thin-film wafer fusion fabrication technology for buried heterostructure InGaAsP/InP lasers on GaAs" @default.
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- W2002685102 doi "https://doi.org/10.1049/el:19991297" @default.
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