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- W2002709768 abstract "Plasma parameters of inductively coupled plasma system with an annular plasma source have been studied experimentally. At low pressures (about 1mTorr), electron temperature inside the plasma source is rather high (8–13eV) and is much greater than in the diffusion (main) chamber (4–5eV). The plasma potential inside the source is also much higher than in the main chamber. There is a rapid drop of the electron temperature and plasma potential at the boundary between the plasma source and the main chamber. The drop of the plasma potential at the boundary (about 20V) means the existence of a strong axial electric field, which retards the electrons inside the plasma source and accelerates the ions from the source into the main chamber. Measurements of ion energy distributions in the main chamber volume reveal the existence of ions with kinetic energies about 15eV." @default.
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- W2002709768 date "2006-02-15" @default.
- W2002709768 modified "2023-09-26" @default.
- W2002709768 title "Spatial variation of plasma parameters and ion acceleration in an inductive plasma system" @default.
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- W2002709768 doi "https://doi.org/10.1063/1.2170419" @default.
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