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- W2003015888 abstract "A closed system fabrication of small geometry, thin film chromium silicide resistors is described. It offers highly reproducible, low resistance ohmic contacts between the resistor material and the aluminum metallization. The technique is very general and can be used for materials other than CrSi 2 and aluminum. The technique is designed for forming resistors in integrated circuits by adding compatible processing steps to the most widely used integrated circuit processing sequences." @default.
- W2003015888 created "2016-06-24" @default.
- W2003015888 creator A5033473693 @default.
- W2003015888 date "1984-11-01" @default.
- W2003015888 modified "2023-09-27" @default.
- W2003015888 title "A closed system fabrication of chromium silicide thin film resistors" @default.
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- W2003015888 doi "https://doi.org/10.1016/0040-6090(84)90307-9" @default.
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