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- W2003048172 abstract "Abstract Channeling contrast analysis using a 400 keV helium-ion microprobe was used to locally investigate lateral damage distributions induced by maskless ion implantation. Angular spreads and incident angles of the microprobe were found to be an order of magnitude smaller than the critical angle of channeling. Channeling contrast images of a damage distribution induced by focused gallium implantation at 100 keV to a dose of 3 × 1015 Ga+/cm2 in silicon could be obtained with a low microprobe dose of 6×1014 He+/cm2." @default.
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- W2003048172 date "1991-04-01" @default.
- W2003048172 modified "2023-09-27" @default.
- W2003048172 title "Channeling contrast analysis of local damage distributions induced by maskless implantation" @default.
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- W2003048172 doi "https://doi.org/10.1016/0168-583x(91)96295-v" @default.
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