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- W2003134503 abstract "A singlemode optical waveguide has been developed with a high refractive index difference Δ of 2% and low loss of 0.12 dB/cm at 1.3 μm wavelength. This waveguide consists of buffer layer, core ridge, and cladding layer of SiOxNyHx formed by the plasma CVD method at a low temperature of 270°C. The absorption loss which is affected by the OH ion content at 1.39 μm wavelength can be decreased by annealing at 500°C under N2 atmosphere. The fabrication process at low temperature is effectively used for the monolithic integration of photonic/electronic circuits." @default.
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- W2003134503 modified "2023-09-23" @default.
- W2003134503 title "High refractive index difference and low loss optical waveguide fabricated by low temperature processes" @default.
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- W2003134503 doi "https://doi.org/10.1049/el:19930749" @default.
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