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- W2003135057 abstract "In the present study, TiO2 thin film was fabricated by sol–gel dip coating technique, and the structural, optical and dielectric characteristics of the film have been investigated to identify the basic characteristics. By the help of the X-ray diffraction spectrum, the structural parameters of the nanostructured TiO2 thin film, such as lattice constants, texture coefficient and crystallite size, were analysed. The value of crystallite size has been evaluated by the Debye–Scherrer and Williamson–Hall methods and also estimated from the field emission SEM images. There was a consistency for the values of crystallite size obtained from all the methods. Swanepoel’s method and transmittance measurements were used to analyse the optical parameters of the TiO2 thin film. Film thickness, refractive index n, extinction coefficient k, band gap energy Eg and Urbach energy Eu have been determined as 264·03 nm, 2·67, 0·067, 3·22 eV and 0·127 eV respectively. It is seen that the real and imaginary parts of the static dielectric constants follow the same pattern and have the values of the real part (7·436 at 655 nm) higher than the imaginary parts (0·038 at 655 nm). Moreover, the Spitzer–Fan model was used for investigation of the values of high frequency dielectric constant ϵ∞ and free optical carrier concentration Nopt. Furthermore, the dissipation factor and optical conductivity of the TiO2 thin film were examined. These results show that understanding the fundamental characteristics of this structure may be of great help in improving the quality of TiO2 for the future of the optoelectronic device technology." @default.
- W2003135057 created "2016-06-24" @default.
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- W2003135057 date "2012-11-01" @default.
- W2003135057 modified "2023-09-25" @default.
- W2003135057 title "Nanostructured TiO<sub>2</sub>thin films: synthesis and characterisations" @default.
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- W2003135057 doi "https://doi.org/10.1179/1753555712y.0000000017" @default.
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