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- W2003226407 abstract "Thin films of Au on single-crystal Si in the nominal size range 10–30 Å have been prepared in ultra-high vacuum. The low-temperature electrical resistance of the films has been measured, and some of the films have been studied in the electron microscope. At helium temperatures, the resistance-temperature behavior is semiconductorlike for those films showing continuity. Activation energies are 0.73 and 0.78 for two films deposited on (111)Si and having C overlays. A film on (100)Si having a Si overlay yielded an activation energy of 0.37 K. Electron microscope studies indicate that one of the films (nominally 30 Å thick) consists of a fairly uniform film 10 Å thick with the rest of the Au in micron-sized blobs. The 10 Å film shows no Au structure, and we speculate on the basis of this and the resistive behavior that there is a surface stabilized compound of Au and Si. A compound is consistent with the segregation of Au to the Si surface reported by Bishop and Rivière." @default.
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- W2003226407 date "1971-01-01" @default.
- W2003226407 modified "2023-09-23" @default.
- W2003226407 title "Low-Temperature Resistance of Thin Films of Gold on Silicon" @default.
- W2003226407 doi "https://doi.org/10.1116/1.1316301" @default.
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