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- W2003268296 abstract "MeV ion implantation systems are now being used on a production basis, providing beam energies in the range from 200 keV to 4 MeV. Interest and demand for such systems has increased since the first system went on-line in May 1983. At present, eight systems have been sold with a maximum beam energy capability of 4 MeV for use in the production environment. Production machines are now available providing beam energies as high as 8 MeV. These systems are capable of providing a wide range of ion species without the use of toxic gases. Present beam current and beam species capabilities will be presented. In addition, we describe new techniques for measuring dose uniformity from MeV implants [W.A. Keenan, Prometrix Corp., 3255 Scott Blvd., Bldg. 2, Santa Clara, CA 95054-3077, USA] and present results of uniformity and particulate measurements. We describe MeV implanter developments, including a new wafer handler." @default.
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- W2003268296 date "1987-04-01" @default.
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- W2003268296 title "Performance of the NEC production high energy implantation system" @default.
- W2003268296 doi "https://doi.org/10.1016/s0168-583x(87)80249-5" @default.
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